HITACHI Ion Milling System IM4000II

IM4000II supports both cross section milling and flat-milling to prepare specimens depending on the purpose. Cooling Temperature Control, Air Protection Holder Unit, and Various options enable preparation of various cross section specimens.

HITACHI Ion Milling System IM4000II
  • HITACHI Ion Milling System IM4000II
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  • Product details
  • Specification parameters
  • High Milling Rate

    The cross section milling rate*1 of the IM4000II is 500 µm/h or greater. It is effective for hard materials that conventionally require extended processing.

    When the swing angle during cross section milling changes, the corresponding processing width and depth change. The figure below shows the SEM images of a Si wafer after cross section milling. Processing conditions are the same as shown above except the swing angle has been reduced from ±30˚ to ±15˚. It is demonstrated that the processing depth is deeper than the above results and therefore very effective for rapid cross section preparation of specimens with a target structure far from the top surface.

    Hybrid Milling

    Cross section Milling

    A pristine surface can be achieved by sputtering (milling) protruding parts of the specimen that extend beyond the maskedge. By irradiating the ion-beam parallel to the processed surface of the specimen, flat and smooth milling is possible even with complex materials of different compositions.

    Main Uses

    • Prepare a cross section specimen in a localized region of interest (ROI)

    • Prepare a cross section specimen that is difficult to polish by other methods (composite materials, multi-layer interface, papers/films, etc.)

    Flat-milling

    In flat-milling, a wider area can be processed than in cross section milling via eccentricity of the ion-beam and rotating specimen center points. It is also possible to emphasize or reduce irregularities by changing the irradiation angle of the ion-beam in order to reveal crystal orientation and/or subtle compositional differences.

    Main Uses

    • Remove mechanical artifacts from the polishing process (maximum diameter of 50 mm x thickness of 25 mm)

    • Remove the surface or upper layers of multilayer film

    • Discriminate layers of the cross section for multilayer film (emphasizing irregularities)

    • Preprocess large areas for EBSD (reducing irregularities)

    Cooling Temperature Control

    Sensitive specimens can be cooled with liquid nitrogen during processing. The cooling temperature control uses indirect cooling and maintains a temperature during processing in order to prevent phase transitions.
    In the example below, specimen cooling suppresses thermal deformation in the heat-sensitive styrene-based latex, resulting in a smooth processed surface.

    Air Protection Holder Unit

    The Air Protection Holder can be used to keep air-sensitive specimens (such as battery material) isolated from the environment. A specimen fabricated using the IM4000II can be loaded into a SEM and/or Atomic Force Microscope (AFM) without exposure to the outside environment. This function can be used in combination with the cooling temperature control (except a flat-milling holder).

    Stereo Microscope Unit for Process Observation

    A stereo microscope can be outfitted to observe the specimen during the milling process. Both binocularand trinocular-type systems are available. The trinocular version (as shown below) allows for view streaming to an external monitor when equipped with a CCD camera.


    High Milling Rate

    The cross section milling rate*1 of the IM4000II is 500 µm/h or greater. It is effective for hard materials that conventionally require extended processing.

    When the swing angle during cross section milling changes, the corresponding processing width and depth change. The figure below shows the SEM images of a Si wafer after cross section milling. Processing conditions are the same as shown above except the swing angle has been reduced from ±30˚ to ±15˚. It is demonstrated that the processing depth is deeper than the above results and therefore very effective for rapid cross section preparation of specimens with a target structure far from the top surface.

    Hybrid Milling

    Cross section Milling

    A pristine surface can be achieved by sputtering (milling) protruding parts of the specimen that extend beyond the maskedge. By irradiating the ion-beam parallel to the processed surface of the specimen, flat and smooth milling is possible even with complex materials of different compositions.

    Main Uses

    • Prepare a cross section specimen in a localized region of interest (ROI)

    • Prepare a cross section specimen that is difficult to polish by other methods (composite materials, multi-layer interface, papers/films, etc.)

    Flat-milling

    In flat-milling, a wider area can be processed than in cross section milling via eccentricity of the ion-beam and rotating specimen center points. It is also possible to emphasize or reduce irregularities by changing the irradiation angle of the ion-beam in order to reveal crystal orientation and/or subtle compositional differences.

    Main Uses

    • Remove mechanical artifacts from the polishing process (maximum diameter of 50 mm x thickness of 25 mm)

    • Remove the surface or upper layers of multilayer film

    • Discriminate layers of the cross section for multilayer film (emphasizing irregularities)

    • Preprocess large areas for EBSD (reducing irregularities)

    Cooling Temperature Control

    Sensitive specimens can be cooled with liquid nitrogen during processing. The cooling temperature control uses indirect cooling and maintains a temperature during processing in order to prevent phase transitions.
    In the example below, specimen cooling suppresses thermal deformation in the heat-sensitive styrene-based latex, resulting in a smooth processed surface.

    Air Protection Holder Unit

    The Air Protection Holder can be used to keep air-sensitive specimens (such as battery material) isolated from the environment. A specimen fabricated using the IM4000II can be loaded into a SEM and/or Atomic Force Microscope (AFM) without exposure to the outside environment. This function can be used in combination with the cooling temperature control (except a flat-milling holder).

    Stereo Microscope Unit for Process Observation

    A stereo microscope can be outfitted to observe the specimen during the milling process. Both binocularand trinocular-type systems are available. The trinocular version (as shown below) allows for view streaming to an external monitor when equipped with a CCD camera.


  • Specification

    General
    Gas usedAr (argon) gas
    Ar gas flow control systemMass flow controller
    Accelerating voltage0.0 to 6.0 kV
    Size616(W)×736(D)×312(H) mm
    MassMain unit : 53 kg+Rotary pump : 30 kg
    Cross section milling
    Maximum milling rate(Material : Si)500 μm/h*1 or more
    Maximum specimen size20(W)×12(D)×7(H) mm
    Specimen moving rangeX±7 mm, Y 0 to +3 mm
    Ion-beam intermittent irradiationON/OFF setting range 1sec to 59 min 59 sec
    Swing angle±15°, ±30°, ±40°
    Wide-area cross section milling-

    *1The maximum milling depth in one hour for Si protruding 100 μm from the maskedge.

    Flat-milling
    Maximum milling areaφ32 mm
    Maximum specimen sizeΦ50×25 (H) mm
    Specimen moving range×0 to +5 mm
    Ion-beam intermittent irradiationON/OFF setting range 1sec to 59 min 59 sec
    Rotation speed1 rpm, 25 rpm
    Swing angle±60°, ± 90°
    Ion-beam irradiation angle0 to 90°

    Optional Specification

    Cooling temperature control*2Indirect cooling by LN2, Range of set
    temperature : 0 to -100 ℃
    Higher beam tolerance mask2× beam tolerance as compared to the standard mask (Cobalt-free)
    Stereo microscope unit for monitoring the process15× to 100×, Binocular type, Trinocular type (correspond to CCD camera)

    *2Option to deliver with the main unit. Some functions may be restricted during the use of cooling temperature control.